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Teledyne Isco

ReaXus PR Class

Dual-headed positive displacement piston pumps that provide high accurate flows and excellent pressure capability for a variety of uses.

ReaXus PR Class

The rugged PR Class consists of dual-headed positive displacement piston pumps that provide high accurate flows and excellent pressure capability for a variety of uses.

Standard fluid path materials are Stainless Steel and in addition to optional Titanium. Other available features include jacketed heads for temperature controlled processes. The pumps are designed for a wide range of Preparative and Semi-Prep Chromatography as well as SMBC (simulated moving bed chromatography) and many process and industrial applications. With 100 mL/min and 300 mL/min versions reaching pressures up to 4,000 psi the pumps will meet the most demanding LC and process needs.

 

Flow Rate Range and Max. Pressure Ratings* ​0.0-100 mL/min (4,000 psi)

0.0-300 mL/min (1,000 psi)

​Pulsation** ≤4.0% @ 50 mL/min and 500 psi (100 mL)
Pressure Accuracy ​±2.0% of full scale pressure
​Flow Precision 0.5% RSD
Flow Accuracy Within 3.0% of set flow rate, 2.0 mL/min and above; 80:20 Water/IPA @ 1,000 psi (100 mL)

Within 4.0% of set flow rate, 5.0 mL/min and above; 80:20 Water/IPA @ 500 psi (300 mL)

​Wetted Materials ​​(See Options on Datasheet), Synthetic Ruby, Sapphire, UHMWPE, PTFE
Dimensions 6.3″ H x 10″ W x 17″ D

(16 x 25.4 x 43.2 cm)

​Weight ​30 lbs. (13.6 kg)
​Power ​100-240 Vac (±10%), 50-60 Hz
​Control RS-232, Micro USB, Run/Stop, Analog (0-10V, 4-20mA)

Related instruments

ReaXus LD Class

Dual-headed, positive displacement piston pumps, delivering unmatched performance for analytical, flash, and small-scale preparative chromatography applications.

ReaXus LS Class

The reliable ReaXus LS Class consists of single-headed, positive displacement piston pumps incorporating advanced cam designs for very low pulsation.​

ReaXus MX Class

The economical MX Class consists of single-headed, positive displacement piston pumps incorporating additional features for challenging applications.

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